Advanced Technologies Co., Ltd. supplying high-output power method of linear ion beam source applicable to various plasma surface treatment, etching, and plasma assist source.
Linear Ion beam source can be applied to various vacuum equipment such as general vacuum coating equipment, In-line sputter equipment, R2R sputter equipment and Cluster coating equipment, and it is a plasma source applicable to various application industry fields

	LIS-400	LIS-700	LIS-1000	LIS-1550
Effective width ¹	350mm	650mm	950mm	1,500mm
Discharge voltage	Max. 3KV	Max. 4KV	Max. 4KV	Max. 5KV
Discharge current	< 0.5A	< 1.0A	< 1.5A	< 2.0A
Power specification ²	3KV / 1A	4KV / 1A	4KV / 2A	5KV / 2A
Process pressure/strong>	0.5 mtorr ~ 3 mtorr
Gas flow	50sccm ~ 300sccm

⑴Effective width : The effective width of the linear ion bean source on the material can be changed in the width of the material
⑵Power supply : Can be changed according to the Linear Ion beam Source size, specification and purpose of use

The Linear Ion beam Source of Advanced Technologies Co., Ltd is a plasma source that can be applied to various industrial fields. From the flexible polymer film to stainless steel plate, the plasma source can be applied to various materials, and it can also be applied as the plasma surface treatment of the material, etching process, and plasma assist source.

Application field	Display, electronic device, new regeneration energy, automobile, steel industry, household appliances field
Applied material	Flexible polymer film, glass and flat-plate material, embodied molded parts, stainless steel plate
Application method	Plasma surface treatment, etching process, plasma assist source

Advanced Technologies Co., Ltd is supply circular type of Ion beam Source applicable to R&D and small-sized equipment.
It is composed to enable simple installation on R&D and small-sized equipment, and it can be utilized as the plasma source for various purposes of development